参考文献/References:
[1] Mitchell J,Lahiji G R,Najafi K.Encapsulation of vacuum sensors in a wafer level package using a gold-silicon eutectic[J].International Conference on Solid-State Sensors,2005,1:928-931.
[2] Sparks D,Massoudansari S,Najafi N.Long-term evaluation of hermetically glass frit sealed silicon to Pyrex wafers with feedthroughs[J].Journal of Micromechanics and Microengineering,2005,15(8):1560-1564.
[3] 师帅,吕植成,汪学方,等.带有TSV的硅基大功率LED封装技术研究[J].半导体光电,2013,34(4): 621-625.
[4] Shi S,Wang X,Xu C,et al.Simulation and fabrication of two Cu TSV electroplating methods for waferlevel 3D integrated circuits packaging[J]. Sensors and Actuators A:Physical, 2013,203(12):52-61.
[5] Shi S,Wang X F,Xu M H,et al.Deep wet etching process of Pyrex glass for vacuum packaging[C]//International Conference on Electronic Packaging Technol and High Density Packaging,2012:44-48.
[6] Shi S, Wang X F, Xu C L, et al. Fabricating processes of free-standing silicon nitride thin film for MEMS devices[C]//International Conference on Electronic Packaging Technol,2013:23-26.
[7] Shi S,Wang X F,Xu C L,et al.Modeling and Simulation of Cu TSV electroplating for wafer-level MEMS vacuum packaging[C]//International Conference on Electronic Packaging Technol,2013: 68-72.