[1]李嘉锐,胡 泓.基于单色光干涉的光刻胶膜厚测量方法[J].机械与电子,2021,(02):59-64.
　LI Jiarui,HU Hong.Photoresist Film Thickness Measurement Method Based on Monochromatic Light Interference[J].Machinery & Electronics,2021,(02):59-64.
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基于单色光干涉的光刻胶膜厚测量方法()
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机械与电子[ISSN:1001-2257/CN:52-1052/TH]

卷:
期数:
2021年02期
页码:
59-64
栏目:
自动控制与检测
出版日期:
2021-02-26

文章信息/Info

Title:
Photoresist   Film  Thickness  Measurement  Method  Based on Monochromatic Light  Interference
文章编号:
1001-2257(2021)02-0059-06
作者:
李嘉锐; 胡 泓
哈尔滨工业大学（深圳）机电工程及自动化学院，广东 深圳 518055
Author(s):
LI Jiarui;  HU Hong
School of Mechanical Engineering and Automation, Harbin Institute of Technology,Shenzhen, Shenzhen 518055,China
关键词:
光刻胶膜厚; 薄膜干涉; 干涉条纹自动计数算法; 单色光干涉; 相对光强原理
Keywords:
photoresist film thickness;  thin film interference;  automatic interference fringe counting algorithm;  monochromatic light interference;  relative light intensity principle
分类号:
TH741;TN305.7
文献标志码:
A
摘要:
针对传统的通过转速与光刻胶膜厚的关系来大致判断膜厚范围的问题，研究了基于单色光干涉的光刻胶膜厚测量方法。基于光刻胶的基本特性，将油膜的膜厚测量方法应用在光刻胶上。基于薄膜干涉原理进行系统的光路设计以及光刻胶膜厚测量平台的设计。进行了干涉条纹自动计数算法的研究以及基于单色光干涉的相对光强原理的研究。最后搭建硬件系统和软件系统，对干涉条纹自动计数算法与单色光干涉的膜厚测量方法进行实验验证与分析，实现了光刻胶膜厚的快速精确测量。
Abstract:
Aiming at  the traditional problem of roughly judging the film thickness range based on the relationship between the rotation speed and the photoresist film thickness, a photoresist film thickness measurement method based on monochromatic light interference was studied. Based on the basic characteristics of photoresist, the film thickness measurement method of oil film is applied to photoresist. The optical path design of the system and the design of the photoresist film thickness measurement platform are based on the principle of thin film interference. The research on the automatic counting algorithm of interference fringes and the principle of relative light intensity based on the interference of monochromatic light are carried out. Finally, a hardware system and a software system are built to verify and analyze the automatic counting algorithm of interference fringes and the film thickness measurement method of monochromatic light interference, and realize the rapid and accurate measurement of the photoresist film thickness.

参考文献/References:

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备注/Memo

备注/Memo:

收稿日期：2020-10-23

作者简介：李嘉锐 (1996-)，男，广东揭阳人,硕士研究生，研究方向为膜厚测量和图像处理；胡 泓 (1965-)，男，重庆人，博士，教授，博士研究生导师，主要研究方向为微机电系统(MEMS)、微流控制技术与精密仪器、线性、非线性控制系统理论、机电一体化系统与智能系统等。
更新日期/Last Update: 2021-02-26